发明名称 |
Positive resist composition |
摘要 |
A positive resist composition is disclosed, comprising (A) a resin containing at least one repeating unit represented by the following formula (I) and at least one repeating unit represented by formula (VII), which decomposes under the action of an acid to increase the solubility in an alkali developer, and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.
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申请公布号 |
US2003108811(A1) |
申请公布日期 |
2003.06.12 |
申请号 |
US20020156227 |
申请日期 |
2002.05.29 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
MIZUTANI KAZUYOSHI;FUJIMORI TORU;KANNA SHINICHI |
分类号 |
G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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