CHEMICAL VAPOR DEPOSITION VAPORIZER

摘要

A Chemical Vapor Deposition (CVD) vaporizer comprising: a liquid supply assembly (102) having an environment supporting a liquid state for a plurality of precursor components of a liquid precursor blend (114); a venturi (112) operative to atomize said liquid precursor blend; a vaporization chamber (106), located proximate to said liquid supply assembly and said venturi, having an environment supporting a vapor state (148) for said plurality of precursor components; and a thermal barrier (104) located between said liquid supply assembly and said vaporization chamber enabling preservation of a substantial temperature disparity between said liquid supply assembly and said proximately located vaporization chamber.