发明名称 |
SEMICONDUCTOR FABRICATION APPARATUS HAVING IMPROVED COLD TRAP PART |
摘要 |
PURPOSE: A semiconductor fabrication apparatus having an improved cold trap part is provided to remove easily residues from a cold trap by separating only an auxiliary tank from the semiconductor fabrication apparatus. CONSTITUTION: A vacuum chamber is used for performing a fabrication process of a semiconductor device. A vacuum pump is used for forming a state of vacuum of the vacuum chamber. A cold trap(20) is connected to the vacuum chamber and the vacuum pump by the first exhaust tube(30) and the second exhaust tube(40), respectively. An auxiliary tank(70) is connected to a bottom of the cold trap and the second exhaust tube by the first auxiliary tube(72) and the second auxiliary tube(74), respectively. A plurality of valves(72a,72b,74a,74b) are connected to the first and the second auxiliary tube. A transparent window(76) is formed at a side of the auxiliary tank.
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申请公布号 |
KR20030046144(A) |
申请公布日期 |
2003.06.12 |
申请号 |
KR20010076580 |
申请日期 |
2001.12.05 |
申请人 |
JU SUNG ENGNEERING CO., LTD. |
发明人 |
CHOI, JEONG HWAN;HAN, YEONG GI;PARK, GYEONG UNG |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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