发明名称 SEMICONDUCTOR FABRICATION APPARATUS HAVING IMPROVED COLD TRAP PART
摘要 PURPOSE: A semiconductor fabrication apparatus having an improved cold trap part is provided to remove easily residues from a cold trap by separating only an auxiliary tank from the semiconductor fabrication apparatus. CONSTITUTION: A vacuum chamber is used for performing a fabrication process of a semiconductor device. A vacuum pump is used for forming a state of vacuum of the vacuum chamber. A cold trap(20) is connected to the vacuum chamber and the vacuum pump by the first exhaust tube(30) and the second exhaust tube(40), respectively. An auxiliary tank(70) is connected to a bottom of the cold trap and the second exhaust tube by the first auxiliary tube(72) and the second auxiliary tube(74), respectively. A plurality of valves(72a,72b,74a,74b) are connected to the first and the second auxiliary tube. A transparent window(76) is formed at a side of the auxiliary tank.
申请公布号 KR20030046144(A) 申请公布日期 2003.06.12
申请号 KR20010076580 申请日期 2001.12.05
申请人 JU SUNG ENGNEERING CO., LTD. 发明人 CHOI, JEONG HWAN;HAN, YEONG GI;PARK, GYEONG UNG
分类号 H01L21/00;(IPC1-7):H01L21/00 主分类号 H01L21/00
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