VACUUM SYSTEM OF EQUIPMENT FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A vacuum system of equipment for fabricating a semiconductor device is provided to prevent vacuum pumps such as a turbo pump or a cryogenic pump from being damaged by using a vacuum back stream generated by delayed shut of valves. CONSTITUTION: The first and second vacuum chambers are prepared. The first vacuum pump is connected to the first vacuum chamber. The second vacuum pump is connected to the second vacuum chamber. The third vacuum pump is connected to the first and second vacuum pumps. The third vacuum pump is located at the back of the first and second vacuum pumps. The first valve is installed in a pipe between the first and third vacuum pumps. The second valve is installed in a pipe between the second and third vacuum pumps. The first air line(510) provides an air signal for driving the first valve. The second air line(550) provides an air signal for driving the second valve. The first delay valve(610), installed in the first air line, delays the driving of the first valve by the air signal. The second delay valve(650), installed in the second air line, delays the driving of the second valve by the air signal.