ULTRASONIC CLEANING APPARATUS, CHEMICAL VAPOR DEPOSITION APPARATUS INCLUDING THE SAME AND APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: An ultrasonic cleaning apparatus is provided to prevent a conveyer belt from being contaminated by effectively eliminating contaminants like light particles floating over the upper surface of a cleaning solution. CONSTITUTION: A cleaning solution(134) and a cleaning target are contained in a cleaning bath(132). An ultrasonic vibration unit(136) applies vibration to the cleaning target contained inside the cleaning bath. A cleaning solution supply unit(142) supplies the cleaning solution to the inside of the cleaning bath to maintain a predetermined water level of the cleaning solution inside the cleaning bath. The first cleaning solution exhaust unit(144,146) exhausts the cleaning solution through the sidewall of the cleaning bath by using an overflow process when the cleaning solution reaches the predetermined water level inside the cleaning bath.