发明名称 Wafer guide and cleaning apparatus having the same
摘要 A wafer guide for supporting at least one semiconductor wafer during a cleaning process, includes side panels having a plurality of side fixing grooves on an upper surface thereof for stabilizing the at least one semiconductor wafer and for maintaining a sufficient distance between a surface of the at least one semiconductor wafer and an adjacent surface; a center panel having a plurality of center fixing grooves on the upper surface thereof for supporting the at least one semiconductor wafer, each of the plurality of center fixing grooves having inner walls, wherein a contact line is formed on each of the inner walls of the center fixing grooves, and wherein the center panel is positioned between the pair of side panels; and a pair of fixing plates, one of the pair of fixing plates being fixedly attached at each end of the center panel and the pair of side panels.
申请公布号 US2003106575(A1) 申请公布日期 2003.06.12
申请号 US20020294684 申请日期 2002.11.15
申请人 MOON BONG-HO;KO YONG-SUN;LEE WON-JUN;JUN YONG-MYUNG;HWANG IN-SEAK 发明人 MOON BONG-HO;KO YONG-SUN;LEE WON-JUN;JUN YONG-MYUNG;HWANG IN-SEAK
分类号 H01L21/306;B08B3/04;H01L21/00;H01L21/304;H01L21/673;(IPC1-7):B08B3/00 主分类号 H01L21/306
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