LOAD-LOCK CHAMBER OF CHEMICAL VAPOR DEPOSITION(CVD) APPARATUS

摘要

PURPOSE: A load-lock chamber of a CVD(Chemical Vapor Deposition) apparatus is provided to be capable of prevent particles from being flowed into a process chamber by forming gas curtain at the upper portion of the load-lock chamber using a gas jetting part. CONSTITUTION: A wafer boat(210) storing a plurality of wafers is located in a loadlock chamber(200). A gas jetting part(220) is installed in the load-lock chamber(200) for preventing an oxide layer from being formed on the surface of the wafers stored in the wafer boat(210). The gas jetting part(220) is provided with a gas supply pipe(222) and a head part(224) located at the upper portion of the load-lock chamber(200) for jetting gas supplied from the gas supply pipe(222) to the upper portion of the load-lock chamber(200). At this time, a gas curtain is formed at the upper portion of the load-lock chamber(200) for preventing particles of the load-lock chamber from being flowed into a process chamber when loading and unloading the wafer boat(210) from the process chamber.