| 摘要 |
For use in association with microlithography systems, retiole chambers and reticle cassettes are disclosed that provide ready access to and exchange of reticles for exposure as well as temperature control of the reticles. In an embodiment a vacuum reticle library is provided in a reticle-storage chamber. The vacuum reticle library includes a rack comprising multiple shelves for holding respective reticles at different respective elevations. One or more shelves comprises a fluid conduit through which is circulated a temperature-controlled fluid. By adjusting and controlling the temperature of the fluid (e.g., water) circulated to each shelf, the temperature of the respective reticles held on the shelves can be controlled and adjusted quickly. Similarly, an atmospheric-pressure reticle library can be provided in an atmospheric-pressure chamber containing a rack of multiple shelves on which respective reticle cassettes (containing reticles) can be stored. The cassettes and reticles can be identified by a bar code or the like that is read to avoid mixups during reticle transport and exchange. <IMAGE> |
