发明名称 |
Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window |
摘要 |
A lithographic projection apparatus has a discharge plasma radiation source that is contained in a vacuum chamber. The radiation source is to generate a beam of EUV radiation. A chamber wall of the vacuum chamber incorporates a channel structure comprising adjacent narrow channels separated by walls that are substantially parallel to a propagation direction of the radiation generated so as to pass the radiation from the vacuum chamber through the structure to another subsequent vacuum chamber. In the subsequent vacuum chamber, a much higher vacuum level (lower pressure) can be maintained than is present in the vacuum chamber of the radiation source.
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申请公布号 |
US6576912(B2) |
申请公布日期 |
2003.06.10 |
申请号 |
US20010752818 |
申请日期 |
2001.01.03 |
申请人 |
VISSER HUGO M.;SANDSTROM RICHARD L.;BISSCHOPS THEODORUS H. J.;BANINE VADIM Y.;JONKERS JEROEN |
发明人 |
VISSER HUGO M.;SANDSTROM RICHARD L.;BISSCHOPS THEODORUS H. J.;BANINE VADIM Y.;JONKERS JEROEN |
分类号 |
G03F7/20;G21K1/06;H01L21/027;(IPC1-7):G21G5/00;G01J3/00;G03B27/70;G03B27/54 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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