发明名称 |
SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY |
摘要 |
<p>Anti-reflective coating materials for ultraviolet photolithography include at least one organic light-absorbing compound incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining at least one organic absorbing compound with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.</p> |
申请公布号 |
AU2002336709(A1) |
申请公布日期 |
2003.06.10 |
申请号 |
AU20020336709 |
申请日期 |
2002.10.31 |
申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
NIGEL HACKER;JOSEPH KENNEDY;RICHARD SPEAR;TERESA BALDWIN |
分类号 |
G03F7/075;C03C17/00;C03C17/30;C07F7/18;C08G77/04;C08G77/12;C08K5/00;C08L83/00;C08L101/00;C09D5/00;C09D7/12;C09D183/04;C09D183/06;C09D183/08;G02B1/11;G03F7/09;G03F7/11;H01L21/027;(IPC1-7):C08G77/12;C08G77/18 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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