发明名称 Semiconductor device and GaN-based field effect transistor for use in the same
摘要 The present invention provides a semiconductor device as an FET integrated object having a small effective area, a small ON resistance during operation, a high voltage resistance, and capable of large-current drive. This device comprises one or more FET's each having a gate electrode, a source electrode, and a drain electrode, and arranged side by side on a single plane to constitute a first block which is stacked on a second block having a configuration identical to the first block, wherein the gate electrode, the source electrode, and the drain electrode of the FET(s) of the first block are directly joined with the gate electrode, the source electrode, and the drain electrode of the FET(s) of the second block, respectively.
申请公布号 US6576927(B2) 申请公布日期 2003.06.10
申请号 US20020084717 申请日期 2002.02.25
申请人 THE FURUKAWA ELECTRIC CO., LTD. 发明人 YOSHIDA SEIKOH;TAKEHARA HIRONARI;WADA TAKAHIRO
分类号 H01L21/337;H01L21/338;H01L29/20;H01L29/80;H01L29/812;(IPC1-7):H01L29/76 主分类号 H01L21/337
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