发明名称 METHOD OF CREATING DIAMOND-LIKE CARBON FILM ON SUBSTRATE AND ARTICLE WITH SUCH FILM ON SUBSTRATE
摘要 FIELD: chemical gaseous deposition of film on article surface. SUBSTANCE: method involves generating plasma in gaseous hydrocarbon and exposing substrate to plasma having electron density not in the excess of 5x1010 per cu.cm and enclosure thickness less than 2 mm at high ion current density and controllable low-energy ion bombardment. Ion current density selected is at least 20 A/sq. m and substrate bias voltage in the range of from 100 V to 1,000 V. Article has substrate with angular surface and diamond-like carbon film with hardness of at least 20 HPa. Film is free from distinctive grains having diameter of at least , when examined with 50,000-fold increase by means of scanning cold-emission microscope. EFFECT: increased deposition rate and improved quality of film having dense structure and increased hardness. 19 cl, 18 dwg, 6 tbl, 2 ex
申请公布号 RU2205894(C2) 申请公布日期 2003.06.10
申请号 RU20000101271 申请日期 1998.06.11
申请人 NORTISTERN JUNIVERSITI 发明人 KHOPVUD DZHEFFRI A.;PEHPPAS DEHVID L.
分类号 B43K1/00;B26B21/60;C23C16/26;C23C16/27;(IPC1-7):C23C16/26 主分类号 B43K1/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利