发明名称 Method and apparatus for fine feature spray deposition
摘要 A system for fine feature spray deposition includes a substrate platform for supporting a substrate on which the features are to be deposited. A spray assembly is provided which includes a spray source for providing a stream of material to be deposited on a substrate, a collimator which is positioned in a path of the stream from said spray source and an aperture assembly, which is positioned downstream of the collimator with respect to the spray source and above the substrate platform. The aperture assembly defines at least one opening to pass a portion of the stream of material onto a surface of the substrate. A drive mechanism is provided which is coupled to at least one of the spray assembly and the substrate platform for inducing relative motion there between. A controller is coupled to the spray assembly and the drive mechanism to control the relative motion and the stream of material. The system allows fine features to be printed directly on a substrate with requiring a predefined mask. Multilayer structures, such as electrical components for circuits or sensor systems, can be formed by sequentially depositing features with various electrical properties.
申请公布号 US6576861(B2) 申请公布日期 2003.06.10
申请号 US20010863482 申请日期 2001.05.23
申请人 THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK 发明人 SAMPATH SANJAY;HERMAN HERBERT;GREENLAW ROBERT
分类号 B05B1/28;C23C4/00;H05K3/10;H05K3/14;H05K3/46;(IPC1-7):B23K10/00 主分类号 B05B1/28
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