| 摘要 |
A micro-lithographic apparatus and method for selectively exposing/masking resist material on a non-planer workpiece or filamentary substrate includes a hollow, energy transparent tubular member with a hollow for containing the workpiece. The tubular member is selectively coated with a layer of energy-opaque material to form the desired pattern. The transparent tube and opaque coating selectively expose/mask the resist material on the workpiece. Alternatively, the apparatus and method include an energy opaque tubular member with apertures formed through the walls of the tubular member. The apertures form the desired pattern. The opaque tube with apertures selectively exposes/masks the resist material. The apparatus and method may also include an energy source and a rotating device for rotating the tubular member, with the workpiece disposed therein, to the energy source or rotating energy source around tubular member or have energy source surround tubular member.
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