| 摘要 |
PURPOSE: A method for forming a micro lens of an image sensor is provided to enhance the optical focusability of the image sensor by minimizing a loss of an incident ray in the micro lens. CONSTITUTION: A photoresist layer is coated on a substrate on which a predetermined process is performed. A photoresist pattern(200) is formed on the substrate by performing an exposure process and a developing process for the photoresist layer. A micro lens is formed by performing a thermal process for the photoresist pattern(200). A predetermined groove is formed on a predetermined region of the substrate in the thermal process for the photoresist pattern(200). The micro lens has an asymmetrical structure or a symmetrical structure.
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