发明名称 |
METHOD FOR MANUFACTURING FLASH MEMORY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a flash memory device capable of not only improving a word line resistance but also improving the quality of a dielectric film and a gate oxide film of a peripheral circuit region. SOLUTION: The method for manufacturing the flash memory device comprises the steps of forming the dielectric film 25, and then forming an amorphous silicon layer 31 to alleviate a topology generated by patterning a first polysilicon layer 24 in a cell region so that the silicon layer 31 conducts a role of a dielectric film protective layer of the cell region at the time of forming the gate oxide film 26 of the peripheral circuit region. COPYRIGHT: (C)2003,JPO
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申请公布号 |
JP2003163291(A) |
申请公布日期 |
2003.06.06 |
申请号 |
JP20010391052 |
申请日期 |
2001.12.25 |
申请人 |
HYNIX SEMICONDUCTOR INC |
发明人 |
RI KONU;KIN HOKICHI;KIN KIJUN;CHIN KONSHU |
分类号 |
H01L21/8247;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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