| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having excellent carrying property in an exposure machine, hardly being scratched, hardly causing irregular density when a PS plate with this photosensitive material is exposed, and having high resistance against tape peeling after development, and to provide a mask material produced by using the above material. SOLUTION: In the heat developable photosensitive material having at least one image forming layer on one face side of a support and at least one protective layer formed thereon and having at least one back layer on the other face side of the support, the photosensitive material contains photosensitive silver halides, organic silver salts and a reducing agent in the side where the image forming layer is formed. The transmission density of the heat developable photosensitive material is≥0.7 at 780 nm wavelength. After the photosensitive material not exposed is subjected to the heat development, the ratio of the transmission densities at 390 nm to at 600 nm is≥1.9 and <3.5. COPYRIGHT: (C)2003,JPO
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