| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stage device available in vacuum capable of smoothly moving a stage substrate in a vacuum chamber at a high speed, usable even when a degree of vacuum does not exceed 10<SP>-5</SP>Pa and comparatively easy to manufacture. <P>SOLUTION: A stage device available in vacuum is composed by penetrating a slide shaft 1 through a small vacuum treating chamber 6b of a vacuum chamber 6 having the large and small vacuum treating chambers 6a and 6b, moving the stage substrate 5 coupled with the slide shaft 1 in the large vacuum treating chamber 6a, providing an exhaust part 2 provided with double exhaust grooves 21 and 22 out of the vacuum chamber 6, airtightly arranging a partition wall 3 having flexibility between the exhaust part 2 and the vacuum chamber 6, and holding and guiding the slide shaft 1 by a static pressure gas bearing 7. Furthermore, a length N from the exhaust groove 21 remotest from the vacuum chamber 6 to an exhaust part end face of the side of the vacuum chamber 6 is an effective moving distance of the stage substrate or longer. <P>COPYRIGHT: (C)2003,JPO</p> |
