| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor phase growth apparatus which increases the operation rate of an apparatus. SOLUTION: A growth chamber 1 and a filter 42 are connected through an exhaust passage 4. The exhaust 4 comprises an exhaust pipe 11, an exhaust pipe 12 and an exhaust pipe 13. A plurality of projecting parts 7 are arranged on the inside wall of the exhaust pipe 12. Thus products generated by an unreacted material gas can be trapped efficiently in the exhaust pipe 12. COPYRIGHT: (C)2003,JPO
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