| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas supplying method and an apparatus thereof, an exposure method and an apparatus based thereon, whereby enabling the apparatus to construct a gas passage efficiently and easily, to supply gas stably into a sealed chamber to fill it with the gas rapidly. SOLUTION: The gas supply apparatus S for supplying an inactive gas into the sealed chamber H formed within a lens-barrel PK comprises a supply passage 10 which is formed inside a portion of the wall of the lens-barrel PK for supplying the gas into the sealed chamber H and an exhaust passage 20 which is formed inside another portion of the wall of the lens-barrel PK separately from the supply passage 10 for exhausting the gas from the sealed chamber H. COPYRIGHT: (C)2003,JPO
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