发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor integrated circuit device for increasing alignment efficiency when a fuse wiring is laser-processed, and a method of manufacturing the same. SOLUTION: The semiconductor integrated circuit device comprises an Si substrate 11, a multilayer wiring layer 12 formed on the Si substrate 11, an insulation film 13 formed on the multilayer wiring layer 12. An uppermost layer 12a is formed with a wiring 21 for connection, an ordinal wiring 22, a fuse wiring 23, an alignment mark 24 for a stepper, and a target mark 25, which are all made of copper film. An external connecting pad electrode 31, an alignment mark 32 for inspection and processing, and an alignment mark 33 for the stepper, which are all made of aluminum, are formed on the insulation film 13. When the fuse wiring 23 is laser-processed, the target mark 25 included in the same wiring layer is used to perform alignment, thereby enabling a reduction in displacement during processing. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003163268(A) 申请公布日期 2003.06.06
申请号 JP20020248677 申请日期 2002.08.28
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TSUURA KATSUHIKO
分类号 H01L23/52;H01L21/3205;H01L21/82;H01L27/10;(IPC1-7):H01L21/82;H01L21/320 主分类号 H01L23/52
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