发明名称 OPTICAL SYSTEM HAVING MULTIPLE OPTICAL ELEMENTS
摘要 PROBLEM TO BE SOLVED: To provide an optical system enabling high precision measurement and a high precision adjustment of the position of each element to be performed in the optical system, and a method of changing positions of an object and an image in the optical system. SOLUTION: The optical system having a plurality of optical elements, in particular, an exposure lens for use in semiconductor lithography has at least one load-dissipating structure. The load-dissipating structure converts a force resulting from the optical element. Further, the optical element comprises a measuring mechanism which is assembled independently from at least the one load-dissipating structure. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003163160(A) 申请公布日期 2003.06.06
申请号 JP20020232109 申请日期 2002.07.08
申请人 CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG 发明人 HOF ALBRECHT;MAUL GUENTER;MUEHLBEYER MICHAEL;MEHLKOPP KLAUS
分类号 G02B7/182;G02B7/00;G02B7/02;G02B27/62;G03F7/20;G21K1/06;G21K5/02;H01L21/027;(IPC1-7):H01L21/027 主分类号 G02B7/182
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