发明名称 |
OPTICAL SYSTEM HAVING MULTIPLE OPTICAL ELEMENTS |
摘要 |
PROBLEM TO BE SOLVED: To provide an optical system enabling high precision measurement and a high precision adjustment of the position of each element to be performed in the optical system, and a method of changing positions of an object and an image in the optical system. SOLUTION: The optical system having a plurality of optical elements, in particular, an exposure lens for use in semiconductor lithography has at least one load-dissipating structure. The load-dissipating structure converts a force resulting from the optical element. Further, the optical element comprises a measuring mechanism which is assembled independently from at least the one load-dissipating structure. COPYRIGHT: (C)2003,JPO
|
申请公布号 |
JP2003163160(A) |
申请公布日期 |
2003.06.06 |
申请号 |
JP20020232109 |
申请日期 |
2002.07.08 |
申请人 |
CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG |
发明人 |
HOF ALBRECHT;MAUL GUENTER;MUEHLBEYER MICHAEL;MEHLKOPP KLAUS |
分类号 |
G02B7/182;G02B7/00;G02B7/02;G02B27/62;G03F7/20;G21K1/06;G21K5/02;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G02B7/182 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|