| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition for electron beams or X-rays having high sensitivity and high resolution and giving an excellent square pattern profile. <P>SOLUTION: In the positive resist composition for electron beams or X-rays containing (a) a compound which produces an acid by irradiation of electron beams or X-rays and (b) a resin having a group which is decomposed by the effect of an acid to increase the solubility in an alkali developing liquid, the compound which produces an acid by irradiation of electron beams or X-rays contains two or more kinds of specified onium sulfonates. <P>COPYRIGHT: (C)2003,JPO |
