| 摘要 |
PROBLEM TO BE SOLVED: To provide an aluminum-containing silicon alloy target for sputtering, which develops no crack and few particles even when sputtered with a direct current of high output. SOLUTION: The aluminum-containing silicon alloy target for sputtering has a composition comprising 0.1-15 mass% Al, 10-50,000 ppm P, the balance Si with unavoidable impurities, and an atom ratio adjusted so as to be P/Al≤1. COPYRIGHT: (C)2003,JPO
|
