发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent yield lowering due to dust produced from a deposited matter of the inside of a vacuum chamber of a semiconductor manufacturing device. SOLUTION: When light is introduced and taken in onto a transmission member by using an optical fiber, it is attached through an adapter for condensing light. Each face of the adapter attaching the optical fiber and the transmission member is an equal area to each cross section. Determination or the like of a cleaning period of the deposited matter accompanying releasing of atmospheric air facilitates since a composition of the deposited matter of the inside of the vacuum chamber and a relative film thickness can be analyzed by being attached to the semiconductor manufacturing device by using the adapter making light amount loss the minimum, and productivity of a semiconductor device can be improved. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003163203(A) 申请公布日期 2003.06.06
申请号 JP20010361892 申请日期 2001.11.28
申请人 HITACHI LTD 发明人 YAMANE MIYUKI;KAWADA HIROKI
分类号 G01B11/06;G01N21/35;G01N21/3563;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 G01B11/06
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