| 摘要 |
<p>A sputtering target produced by stamp forging, characterized in that an average crystal grain size D at a portion where an average crystal grain size is the largest and an average crystal grain size d at a portion where an average crystal grain size is the smallest are related as 1.0<D/d<2.0. A method capable of constantly producing a sputtering target excellent in characteristics by improving and elaborating forging and heat treating processes to render a crystal size fine and uniform, and a sputtering target excellent in quality obtained by this method.</p> |
