发明名称 |
Mask for proximity field optical exposure, exposure apparatus and method therefor |
摘要 |
A mask for exposure 1 having an aperture in a prescribed pattern formed on one surface and subjected to proximity field exposure in a state kept in contact with the surface of a wafer 2. The mask 1 is made of a transparent material such as glass or quartz glass. The mask 1 forms a circular shape with a thickness of 1 mm or less, preferably 0.1-0.5 mm. |
申请公布号 |
US2003103195(A1) |
申请公布日期 |
2003.06.05 |
申请号 |
US20020295893 |
申请日期 |
2002.11.18 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TSURUMA ISAO;NAYA MASAYUKI;MUKAI ATSUSHI |
分类号 |
G03B27/42;G03B27/58;G03C5/00;G03F1/00;G03F1/14;G03F1/60;G03F7/20;H01L21/027;(IPC1-7):G03B27/48 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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