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发明名称
Verfahren und Vorrichtung zur Reinigung eines Plasmareaktors
摘要
申请公布号
DE69623731(T2)
申请公布日期
2003.06.05
申请号
DE1996623731T
申请日期
1996.12.03
申请人
APPLIED MATERIALS, INC.
发明人
YE, YAN;HANAWA, HIROJI;MA, DIANA XIAOBING;YIN, GERALD ZHEYAO
分类号
H05H1/46;H01J37/32;H01L21/00;H01L21/302;H01L21/304;H01L21/3065;(IPC1-7):H01J37/32
主分类号
H05H1/46
代理机构
代理人
主权项
地址
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