发明名称 |
Surface treatment process |
摘要 |
On an optical device, a metal mask is formed in the shape of a dot array, and then reactive ion etching is performed. The etching is continued while the diameter of the metal mask gradually becomes smaller until the area of the metal reduces to a predetermined area. This produces on the optical device a conical shape with a high aspect ratio, realizing an anti-reflection structure that exerts an anti-reflection effect on light spreading in a range of wavelengths wider than ever and that depends less on the angle of incidence
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申请公布号 |
US2003102286(A1) |
申请公布日期 |
2003.06.05 |
申请号 |
US20030239563 |
申请日期 |
2003.01.02 |
申请人 |
TAKAHARA KOJI;TOYOTA HIROSHI |
发明人 |
TAKAHARA KOJI;TOYOTA HIROSHI |
分类号 |
C03C15/00;C23F4/00;G02B1/11;G02B1/12;(IPC1-7):C23F1/00;B44C1/22;C03C25/68 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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