发明名称 Surface treatment process
摘要 On an optical device, a metal mask is formed in the shape of a dot array, and then reactive ion etching is performed. The etching is continued while the diameter of the metal mask gradually becomes smaller until the area of the metal reduces to a predetermined area. This produces on the optical device a conical shape with a high aspect ratio, realizing an anti-reflection structure that exerts an anti-reflection effect on light spreading in a range of wavelengths wider than ever and that depends less on the angle of incidence
申请公布号 US2003102286(A1) 申请公布日期 2003.06.05
申请号 US20030239563 申请日期 2003.01.02
申请人 TAKAHARA KOJI;TOYOTA HIROSHI 发明人 TAKAHARA KOJI;TOYOTA HIROSHI
分类号 C03C15/00;C23F4/00;G02B1/11;G02B1/12;(IPC1-7):C23F1/00;B44C1/22;C03C25/68 主分类号 C03C15/00
代理机构 代理人
主权项
地址