| 发明名称 |
Polishing film and method of producing same |
| 摘要 |
A polishing film is formed by treating silica particles with heat at 100-400 C. for 4-48 hours and a polishing layer with no internal holes and a thickness of 50 mum or greater, containing 50-85 weight % of such heat-treated silicon particles is formed by fixing these silica particles with a binder resin
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| 申请公布号 |
US2003101658(A1) |
申请公布日期 |
2003.06.05 |
| 申请号 |
US20020200466 |
申请日期 |
2002.07.18 |
| 申请人 |
NIHON MICROCOATING CO., LTD. |
发明人 |
OHNO HISATOMO;IZUMI TOSHIHIRO |
| 分类号 |
B05D7/04;B05D7/24;B24D3/00;B24D3/28;B24D11/00;C03C19/00;C08J5/14;C08J7/04;C09C1/68;C09K3/14;(IPC1-7):C09C1/68 |
主分类号 |
B05D7/04 |
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