发明名称 |
Method for manufacturing an under-bump metallurgy layer |
摘要 |
In a method for manufacturing an under-bump metallurgy (UBM) layer, a plate having a plurality of openings is prepared. Then, the plate is placed on the wafer. Finally, the material of the under-bump metallurgy layer is sputtered on the wafer using the plate as a sputter mask so as to quickly form the under-bump metallurgy layer.
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申请公布号 |
US2003104683(A1) |
申请公布日期 |
2003.06.05 |
申请号 |
US20020043174 |
申请日期 |
2002.01.14 |
申请人 |
CHEN SHIH-KUANG;HSU CHIH-HSIANG |
发明人 |
CHEN SHIH-KUANG;HSU CHIH-HSIANG |
分类号 |
H01L21/60;(IPC1-7):H01L21/20;H01L21/44 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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