发明名称 Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane
摘要 A pad conditioning assembly includes a conditioner head with an end effector movable into contact with a polishing pad,a plurality of downwardly-projecting movable conditioning elements disposed at a bottom of the end effector; and a compliant backing member disposed above and adjacent the conditioning elements, wherein forces applied by the compliant backing member are transferred to the movable conditioning elements to move the conditioning elements. In one aspect, a pressurization circuit applies a pressure from a pressure source to the compliant backing member to flex the compliant backing member against the movable conditioning elements.
申请公布号 US6572446(B1) 申请公布日期 2003.06.03
申请号 US20000664603 申请日期 2000.09.18
申请人 APPLIED MATERIALS INC. 发明人 OSTERHELD THOMAS H.;BIRANG MANOOCHER;TOLLES ROBERT D.;ZUNIGA STEVEN;GARRETSON CHARLES C.
分类号 B24B37/04;B24B53/007;(IPC1-7):B24B51/00 主分类号 B24B37/04
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