| 摘要 |
A method of controlling an amount of exposure, in which, when a pattern on a reticle is illuminated by illuminating light from a light source so as to be projected onto a substrate, an amount of light at a position substantially conjugate with a projected area on the substrate is measured and an amount of exposure applied to the substrate is controlled based upon a result of this measurement. The position at which the amount of light is measured is a position substantially conjugate with an off-optical-axis position in the projected area on the substrate.
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