| 摘要 |
Charged-particle-beam (CPB) microlithography apparatus and methods are disclosed that employ a segmented reticle in which the pattern defined by the reticle is divided into multiple subfields, and each subfield is subdivided into multiple subregions each constituting a respective "group" of subregions. During exposure of the pattern from the reticle to a sensitive substrate using a charged particle beam, a charged-particle illumination beam is directed in sequence to each of the groups. At each group, the illumination beam is directed to expose the respective subregions in the group in a predetermined order before directing the illumination beam to a subsequent group. Direction of the illumination from one group to the next can be performed using a first deflector, and direction of the illumination beam from one subregion to the next in a group can be performed using a second deflector.
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