发明名称 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site
摘要 A high-speed method and system for precisely positioning a waist of a material-processing laser beam to dynamically compensate for local variations in height of microstructures located on a plurality of objects spaced apart within a laser-processing site are provided. In the preferred embodiment, the microstructures are a plurality of conductive lines formed on a plurality of memory dice of a semiconductor wafer. The system includes a focusing lens subsystem for focusing a laser beam along an optical axis substantially orthogonal to a plane, an x-y stage for moving the wafer in the plane, and a first air bearing sled for moving the focusing lens subsystem along the optical axis.
申请公布号 US6573473(B2) 申请公布日期 2003.06.03
申请号 US20010001104 申请日期 2001.11.02
申请人 GENERAL SCANNING INC. 发明人 HUNTER BRADLEY L.;CAHILL STEVEN P.;EHRMANN JONATHAN S.;PLOTKIN MICHAEL
分类号 B23K26/04;B23K26/08;B23K101/40;G03F7/20;H01L21/82;(IPC1-7):B23K26/02 主分类号 B23K26/04
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