发明名称 Dual collimated deposition apparatus and method of use
摘要 A dual collimation deposition apparatus and method are disclosed in which the dual collimation apparatus includes at least a long-throw collimator in combination with one or more physical collimators. A new physical collimator and shield design are also disclosed for improved process uniformity and increased equipment productivity.
申请公布号 US6572744(B1) 申请公布日期 2003.06.03
申请号 US20010767576 申请日期 2001.01.22
申请人 VEECO INSTRUMENTS, INC. 发明人 PARANJPE AJIT;SCHWARTZ PETER;KOOLS JACQUES;SONG KANG;HEIMANSON DORIAN;MOSLEHI MEHRDAD
分类号 C23C14/04;C23C14/22;C23C14/34;G11B5/31;H01J37/34;(IPC1-7):C23C14/34 主分类号 C23C14/04
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