| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivities against exposures such as far ultraviolet light, exima laser, or electron radiation, also having an excellent shelf stability, and to provide a novel monomer used to produce a polarity-transfer polymer having an excellent property as a base resin for the radiation-sensitive resin composition. <P>SOLUTION: The polymeric compound is represented by general formula (I). The polymer contains 5 to 100% by mole of structure unit represented by general formula (II) and 0 to 95% by mole of structure unit derived from other vinyl monomer, and the weight-average molecular weight is in the range of 1,000 to 100,000. The radiation-sensitive resin composition contains said polymer (a) and a compound (b) which can produce an acid by irradiation of an actinic light. <P>COPYRIGHT: (C)2003,JPO |
