发明名称 Semiconductor device and method for fabricating the same
摘要 A bipolar transistor device with a large current capacity is formed by connecting a plurality of transistor elements to each other in parallel, each transistor element having a collector layer, a base layer, and an emitter layer formed respectively in a semiconductor substrate. In the bipolar transistor device, the base layers of a plurality of the transistor elements are extended in parallel to each other and those base layers are separated from each other. In each separated base layer, a first base electrode is formed on a part of the base layer which is separated from an emitter junction with the emitter layer, and a second base electrode is formed on another portion of the base layer closer to the emitter junction than the first base electrode. To dispose the base electrodes of a plurality of the transistor elements in parallel to each other, a base wiring is connected to the first base electrodes of those elements electrically. Consequently, a ballast resistor that causes no variation in the resistance value can be connected to each of a plurality of the transistor elements.
申请公布号 US6573540(B2) 申请公布日期 2003.06.03
申请号 US20010026968 申请日期 2001.12.27
申请人 HITACHI, LTD. 发明人 KUROKAWA ATSUSHI;YAMANE MASAO;MOCHIZUKI KAZUHIRO
分类号 H01L21/02;H01L21/331;H01L21/8222;H01L21/8252;H01L27/06;H01L27/082;H01L29/205;H01L29/73;(IPC1-7):H01L31/072 主分类号 H01L21/02
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