发明名称 |
METHOD FOR PRODUCING A MICROELECTRONIC CIRCUIT AND A MICROELECTRONIC CIRCUIT |
摘要 |
A method for fabricating a microelectronic circuit having an improved electrically conductive element. The method includes providing a finished processed microelectronic circuit having a monolithically integrated coil and having a passivation layer situated above at least the monolithically integrated coil. The method further comprises removing at least part of the passivation layer above the monolithically integrated coil and applying a metal layer above the monolithically integrated coil so that the metal layer is electrically coupled to the monolithically integrated coil.
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申请公布号 |
KR20030043986(A) |
申请公布日期 |
2003.06.02 |
申请号 |
KR20037004786 |
申请日期 |
2003.04.03 |
申请人 |
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发明人 |
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分类号 |
H01F41/04;H01L27/02;H01L21/02;H01L21/822;H01L27/04;H01L27/08 |
主分类号 |
H01F41/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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