发明名称 METHOD FOR PRODUCING A MICROELECTRONIC CIRCUIT AND A MICROELECTRONIC CIRCUIT
摘要 A method for fabricating a microelectronic circuit having an improved electrically conductive element. The method includes providing a finished processed microelectronic circuit having a monolithically integrated coil and having a passivation layer situated above at least the monolithically integrated coil. The method further comprises removing at least part of the passivation layer above the monolithically integrated coil and applying a metal layer above the monolithically integrated coil so that the metal layer is electrically coupled to the monolithically integrated coil.
申请公布号 KR20030043986(A) 申请公布日期 2003.06.02
申请号 KR20037004786 申请日期 2003.04.03
申请人 发明人
分类号 H01F41/04;H01L27/02;H01L21/02;H01L21/822;H01L27/04;H01L27/08 主分类号 H01F41/04
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