WAFER EDGE EXPOSURE APPARATUS

摘要

PURPOSE: A wafer edge exposure apparatus is provided to perform continuously a process by using a couple of light sources, alternately. CONSTITUTION: A couple of lamp modules(10) includes a UV lamp(11) for exposing an edge of a wafer. A switch(20) is connected with the lamp modules by an optical fiber(40). The switch is used for switching the power supplied to the lamp modules. A controller(30) is used for checking the illumination intensity of the UV lamp mounted in the inside of the lamp modules. The controller checks the illumination intensity of the UV lamp by using sensors(12) installed at the lamp modules. The controller is connected with an alarm portion(50) in order to generate an alarm sound when the checked value of the illumination intensity of the UV lamp corresponds to a predetermined value of the illumination intensity.