| 摘要 |
PURPOSE: An etching liquid is provided to etch equally a gold or gold alloy layer on a substrate for a semiconductor or a liquid crystal equally wherein gold or gold alloy columns are formed on the layer, and which etches scarcely the gold or gold alloy columns. CONSTITUTION: In an etching liquid comprising solute and a solvent which is for etching a gold or gold alloy layer being formed on the surface of a substrate for a semiconductor device or a liquid crystal device and having plural gold or gold alloy columns on the layer, the etching liquid comprises at least iodine, at least one iodine compound, and alcohol as the solute, wherein the alcohol is primary alcohol, wherein the iodine is contained in an amount of 0.5 to 10% by weight, wherein the columns have a square shape, and the height (H) of the columns perpendicular to the substrate to the least distance (d) between the adjacent columns (H/d) is more than 1, wherein the least distance (d) between the adjacent columns is 10 μm or less, wherein the iodine compound is an iodide salt, wherein the etching liquid further comprises a surfactant, and wherein the solvent is water.
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