发明名称 COATING FORMING APPARATUS
摘要 <p>PURPOSE: A coating forming apparatus is provided to stabilize the discharge of a coating liquid and form a coating having high thickness uniformity when the coating liquid is supplied to a substrate while a nozzle unit moves in the X-direction and the coating is formed on the substrate. CONSTITUTION: The substrate is horizontally held by a substrate holding portion freely movable in the Y-direction, and a nozzle portion(5) is provided above and opposing the substrate, and movable in the X-direction corresponding to a coating liquid feeding region of the substrate. A discharge opening(54) is formed at a lower end of the nozzle portion, and a channel connecting the discharge opening with a coating liquid feed tube coupled to an upper end of the nozzle portion is formed within the discharge opening. At the midstream of the channel, a liquid pool portion larger in diameter than the discharge opening is formed, the inside of which is provided with a filtering member formed by porous bodies blocking the channel. The filtering member forms a pressure loss portion, which absorbs pulsation occurring at the coating liquid feed tube before it reaches the discharge opening.</p>
申请公布号 KR20030043740(A) 申请公布日期 2003.06.02
申请号 KR20020074116 申请日期 2002.11.26
申请人 TOKYO ELECTRON LIMITED 发明人 KITANO TAKAHIRO;KOGA NORIHISA;TAKEI TOSHICHIKA;KAWAFUCHI YOSHIYUKI
分类号 H01L21/30;B05B13/04;B05C5/02;B05C11/10;H01L21/00;(IPC1-7):H01L21/30 主分类号 H01L21/30
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