PROJECTION EXPOSURE SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide projection optics for a projection exposure system which has a small residual imaging error and is equipped with a light source emitting projection light and the projection optics arranged between a mask and an image. SOLUTION: Many lenses used for the projection optics are divided into several groups and some lenses in each of the groups are corrected so as to be movable. In this case, the mask arranged in an object plane is also made movable in some cases.