| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for liquid colorimetry by which changes in the film thickness of a member for forming thin liquid film caused by contamination can be coped with, in liquid colorimetry. SOLUTION: This method includes a thin air film-forming step of forming a thin air film, by forming a specific clearance between first and second members which are arranged in a state, where their transparent flat surface sections are made to in parallel face to each other, by putting air in between the members 1 and 2, a step of conducting spectrometry on the thin air film by irradiating the area of the thin air film with light and conducting spectrometry on transmitted light and/or the reflected light, and an air film thickness calculation step of calculating the thickness of the thin air film, by using the intensity of measured spectra; a thin liquid film forming step of forming a thin liquid film by forming a specific clearance between the first and second members by putting a colored liquid between the members, a step of conducting spectrometry on the thin liquid film by irradiating the area of the thin liquid film with light and conducting spectrometry on transmitted light and/or reflected light, and a correcting step of calculating the difference between the thickness of the thin air film obtained in the air film thickness calculating step and that of the liquid film, set in the thin liquid film forming step and correcting the measured optical characteristics of the liquid film according to the difference.
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