EXPOSURE METHOD, EXPOSURE SYSTEM, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND MASK

摘要

PROBLEM TO BE SOLVED: To provide an exposure method and an exposure system which can remarkably improve resolution of a fine pattern and to provide a method for manufacturing a semiconductor device, and a mask. SOLUTION: The exposure method is provided with a process for making a charged particle beam B enter a mask in which a charged particle beam transmission part 3a is formed with a prescribed pattern, a process for selecting charged particles having specified energy from among charged particles which have passed the mask 3 by using an energy selecting means 5, and a process for making the selected charged particles having the specified energy enter a sensitized surface 6. This exposure system is used for the exposure method. This method for manufacturing a semiconductor device includes the exposure method, and this mask is used for exposure.