| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method including a photosensitive film removing and cleaning method with excellent contact resistance by effectively removing a residue formed in a via contact hole by continuously carrying out dry cleaning in photosensitive film removal. SOLUTION: This method includes a step of forming an inter-layer insulating film on metal wires, a step of forming a photosensitive film pattern on the inter-layer insulating film, a step of forming an exposure area where a partial area of the metal wires is exposed by etching the inter-layer insulating film, and a photosensitive film removing and cleaning step of removing and cleaning the photosensitive film pattern. The photosensitive film removing and cleaning step includes a step of removing a polymer produced on the side wall of the exposure area by a photosensitive film stripping unit, a step of removing the photosensitive film pattern by the photosensitive film stripping unit, and a step of removing the residue produced on the bottom of the exposure area by the photosensitive film stripping unit.
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