发明名称 |
SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device which has a varactor diode, having a sufficiently satisfactory wide capacitance range and linearity of capacitance variation to a control voltage, formed on one semiconductor substrate together with other elements and a manufacturing method for a semiconductor device which can manufacture such a semiconductor device at low cost without altering processes of forming other elements as much as possible as to a semiconductor device which has a transistor and a varactor diode on one semiconductor substrate and a manufacturing method for such a semiconductor device. SOLUTION: A process of introducing impurities of a 1st conductivity into only a 2nd region where the varactor diode is formed to the processes of forming other elements and diffusion is carried out in an existing heat-treating process to form a 1st conductivity diffusion layer 106 which contacts the reverse surface of a 2nd conductivity diffusion layer 107.
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申请公布号 |
JP2003158199(A) |
申请公布日期 |
2003.05.30 |
申请号 |
JP20010358980 |
申请日期 |
2001.11.26 |
申请人 |
KAWASAKI MICROELECTRONICS KK |
发明人 |
KUNO ISAMU |
分类号 |
H01L21/8238;H01L21/8234;H01L27/088;H01L27/092;H01L29/93;(IPC1-7):H01L21/823;H01L21/823 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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