| 摘要 |
PROBLEM TO BE SOLVED: To provide a method, apparatus and system for treating a substrate, which contribute to improvement of uniformity of line width even in environment in which impurities of molecule level are present. SOLUTION: Before a wafer W is transferred to an exposure device which exposes resists on the wafer W, the wafer W coated with the resist in a treating chamber R is exposed to vapor supplied from a vapor generator 35 and then the vapor, for example, moisture is adsorbed uniformly by the resist on the wafer W, so uniform exposure is carried out in a subsequent exposure process, so that the uniformity of line width on the wafer W can be improved. |
