PHOTORESIST REMOVER COMPOSITION AND REMOVING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a photoresist removing composition which can easily remove a photoresist without corroding various materials of semiconductor layers and can be rinsed only with water without using an organic solvent after removing the photoresist. SOLUTION: The photoresist removing composition comprises an alkali compound, hydroxymethylamine and an aromatic dihydroxy compound.