发明名称 |
HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS |
摘要 |
A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography. |
申请公布号 |
WO03002454(A3) |
申请公布日期 |
2003.05.30 |
申请号 |
WO2002JP06519 |
申请日期 |
2002.06.27 |
申请人 |
SHOWA DENKO K. K.;TORISU, JUNICHI;ATOBE, HITOSHI;HOSHINO, YASUYUKI |
发明人 |
TORISU, JUNICHI;ATOBE, HITOSHI;HOSHINO, YASUYUKI |
分类号 |
C01B7/20;G01N21/03;G01N21/09;G01N21/35;G01N30/14;H01S3/036;H01S3/225 |
主分类号 |
C01B7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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